Foundry Services
Nitride
Oxide
Silicon
Metals
PECVD Nitride / PECVD Low Stress Nitride
Our PECVD Nitride can be a great alternative to LPCVD Nitride when it becomes important to stay within lower temperature ranges. Widely used in MEMS and Semiconductor processing, PECVD nitride is a tensile stress film that can be used as a passivation layer or to help balance film stress within a stack. Using PECVD Nitride in addition to PECVD Oxide will help to reduce overall film stress, preventing delaminating and micro-cracking.
In addition to our Standard PECVD Nitride we also offer Low Stress PECVD nitride for applications where a thicker film is required.
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