Foundry Services

Our PECVD Oxide is a single sided film that has been optimized for wafers requiring minimal thermal processing, and is often used during the semiconductor manufacturing process to form intra-metal dielectric stacks. PECVD Oxide is also used in MEMS and Surface micro-machining processes. In addition to our standard PECVD Oxide we also offer carbon doped PECVD Oxide as a low-k dielectric. Our PECVD Oxide films offer you greater process flexibility and can be combined with many of our other films including PECVD Nitride, LPCVD Nitride and PVD Metals.