Foundry Services
Nitride
Oxide
Silicon
Metals
PECVD OxyNitride
Our PECVD OxyNitride is a unique film that is widely used in the fabrication of MEMS and Opto-Electronics devices. PECVD OxyNitride is mechanically stable and possesses optical properties that make this film ideal for building Waveguides and integrated optical circuits. PECVD OxyNitride is also used in during MEMS device fabrication to build mechanical structures.
Our PECVD OxyNitride is available in any refractive index target from 1.48 to 1.88. Since PECVD OxyNitride has a low film stress, it can also be deposited at greater thicknesses than our standard PECVD Nitride.
DEVICE FABRICATION
Learn how our MEMS Foundry can reduce your cost, cut your lead time and increase your bottom line
more >>>
FOUNDRY SERVICES
Our MEMS Foundry maintains one of most diverse compilation of Thin Films Processes commercially available
more >>>
REQUEST A QUOTE
Let us know how we can help you.
more >>>
