Foundry Services
Nitride
Oxide
Silicon
Metals
Super Low Stress LPCVD Nitride
Our Super low Stress LPCVD Nitride has all of the same benefits of our Low Stress LPCVD Nitride and can be deposited up to even greater thickness. We have developed our Super Low Stress LPCVD Nitride for applications that require a film that has extremely low stress. This specially engineered Super Low Stress LPCVD Nitride can be deposited up to 4µm in thickness without cracking or pealing.
Super Low Stress LPCVD Nitride adds flexibility to many device fabrication processes and is now commercially available in greater thicknessess than ever before! Call now to discuss your unique needs with our highly knowledgeable staff.
DEVICE FABRICATION
Learn how our MEMS Foundry can reduce your cost, cut your lead time and increase your bottom line
more >>>
FOUNDRY SERVICES
Our MEMS Foundry maintains one of most diverse compilation of Thin Films Processes commercially available
more >>>
REQUEST A QUOTE
Let us know how we can help you.
more >>>
