PECVD Silicon Carbide
Wafer sizes up to 300mm!

We are pleased to offer you the option of PECVD Silicon Carbide. This highly durable thin film can be deposited alone or within stack of PECVD Oxide and/or Nitride. PECVD Silicon Carbide is the perfect choice for use as a hard mask for bulk micromachining of your finished wafers.

Here's what makes our PECVD Silicon Carbide an exciting film:

•  High thermal conductivity
•  High mechanical strength
•  High chemical inertness
•  Resistance to etching with HF, KOH and TMAH
•  Easily etched with CF 4 /SF 6 based dry etching
•  Compressive stress. Can be annealed to increase tensile stress

PECVD Low-K Carbon Doped Oxide

Coming soon!

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